Japan Intellectual Property Rights: CERIUM-BASED ABRASIVE MATERIAL, POLISHING LIQUID, POLISHING LIQUID PRODUCTION METHOD, AND GLASS POLISHING METHOD

Japan, Oct. 21 -- RESONAC HOLDINGS CORP has got intellectual property rights for 'CERIUM-BASED ABRASIVE MATERIAL, POLISHING LIQUID, POLISHING LIQUID PRODUCTION METHOD, AND GLASS POLISHING METHOD.' Other related details are as follows:

Application Number: JP,2024-213113

Category (FI): C09G1/02,B24B37/00@H,C09K3/14,550@D,C09K3/14,550@Z,C01F17/259

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Dec. 6, 2024

Publication Date: Feb. 26, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.