Japan, Feb. 24 -- HITACHI LTD has got intellectual property rights for 'CHARGE PARTICLE BEAM DEVICE AND METHOD FOR MEASURING ELECTRIC RESISTANCE.' Other related details are as follows:
Application Number: JP,2023-031156
Category (FI): H10P74/00@E,H10P74/00@C,H01L21/66@E,H01L21/66@C,H01J37/28@B,H01J37/22,502@H
Stage: PROBLEM TO BE SOLVED: To provide a charge particle beam device which allows rapid and reliable acquisition of the electric resistance of a sample.SOLUTION: The present invention relates to a charge particle beam device for measuring the electric resistance of a sample 105 having a laminate structure in at least a part of the sample, the laminate structure being formed of an upper layer conductor 201 and a lower layer conductor 203, and an insulation body 202 in between. The charge particle beam device radiates a charge particle beam on a specified measurement part of the upper layer conductor of the sample by a charge particle beam optical system. A current measurement unit 118 measures a sample current flowing from the upper layer conductor to the lower layer conductor. A detection system measures the energy distribution of secondary electrons discharged from the sample. The control system calculates the electric resistance of a measurement part on the basis of the sample current and the energy distribution of the secondary electrons.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: March 1, 2023
Publication Date: Sept. 12, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
