Japan Intellectual Property Rights: CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER, AND MANUFACTURING METHOD OF RUTHENIUM WIRING

Japan, March 5 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER, AND MANUFACTURING METHOD OF RUTHENIUM WIRING.' Other related details are as follows:

Application Number: JP,2024-219689

Category (FI): H01L21/308@F,H10P50/66,C23F1/30

Stage: PROBLEM TO BE SOLVED: To provide a chemical solution used for cleaning or etching a ruthenium-containing layer, capable of obtaining a ruthenium-containing layer with reduced surface roughness while maintaining a good etching rate for ruthenium, and a manufacturing method of a ruthenium wiring using the chemical solution.SOLUTION: A chemical solution is used for cleaning or etching a ruthenium-containing layer containing orthoperiodic acid (A), a base component (B), and a compound (C) selected from the group consisting of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid.SELECTED DRAWING: None (Grant)

Filing Date: Dec. 16, 2024

Publication Date: Feb. 21, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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