Japan Intellectual Property Rights: CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING METHOD

Japan, Oct. 21 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING METHOD.' Other related details are as follows:

Application Number: JP,2023-071288

Category (FI): G03F7/038,601,G03F7/004,504,G03F7/004,503@A,G03F7/039,601,G03F7/004,501,C08F220/10,C07D493/08,C07J9/00,C07D307/93,C07D311/92,102,G03F7/20,521,G03F7/20,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: April 25, 2023

Publication Date: Nov. 7, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.