Japan Intellectual Property Rights: CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Japan, April 22 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2022-089738

Category (FI): C07D491/18,C07D209/94,C07D327/04,C07D495/18,C07D307/77,G03F7/20,521,G03F7/004,503@A,G03F7/038,601,C08F12/24,C08F20/30,G03F7/004,501,C07C309/31,C07C309/42,C07C71/00,C07C381/12,C07D279/20,C07D327/08,C07D333/76,C07D339/08,C07D327/06,C07D333/52,C07D335/02,C07D333/02

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 1, 2022

Publication Date: Dec. 13, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.