Japan Intellectual Property Rights: CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Japan, April 22 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2022-089720

Category (FI): G03F7/039,601,G03F7/20,521,G03F7/004,501,G03F7/004,503@A,G03F7/09,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 1, 2022

Publication Date: Dec. 13, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.