Japan Intellectual Property Rights: CHEMICALLY AMPLIFIED RESIST MATERIAL AND PATTERN FORMING METHOD

Japan, Jan. 20 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED RESIST MATERIAL AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-005028

Category (FI): G03F7/038,601,G03F7/20,501,G03F7/20,521,G03F7/004,501,G03F7/039,601,G03F7/004,503@A

Stage: Grant (IP right document published.)

Filing Date: Jan. 17, 2023

Publication Date: Jan. 15, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.