Japan, July 14 -- SHIBAURA MECHATRONICS CORP has got intellectual property rights for 'CLEANING APPARATUS.' Other related details are as follows:
Application Number: JP,2022-151470
Category (FI): H10P70/00,103@A,B08B1/20,B08B1/12,B08B1/00,B08B3/02@B,H01L21/304,643@A,H01L21/304,644@B,H10P70/00,104@B,B08B1/40
Stage: PROBLEM TO BE SOLVED: To provide a cleaning apparatus which can prevent penetration of a cleaning fluid into a rotary mechanism and prevent adhesion of dust from the rotary mechanism to a substrate.SOLUTION: In a cleaning apparatus, each of multiple rollers which contact with an outer periphery of a substrate W to rotate the substrate W has: a transmission part 101; a rotation mechanism 110 which rotates the transmission part 101 through a rotary shaft 111; a cover 120 which is disposed between the transmission part 101 and the rotation mechanism 110 and covers the rotation mechanism 110; a discharge port 121 which is provided at the cover 120 and discharges a gas to a space between the cover 120 and the transmission part 101; and a negative pressure area 124 which is provided at the rotation mechanism 110 side in the cover 120 to create a negative pressure relative to an atmospheric pressure of the outside of the cover 120 with exhaust air. The cleaning device further includes cleaning parts each of which discharges a cleaning fluid L from a cleaning fluid discharge part to the substrate W and uses a swinging arm to place a brush in contact with at least one surface of the rotating substrate W to clean the surface of the substrate W.SELECTED DRAWING: Figure 2 (Grant)
Filing Date: Sept. 22, 2022
Publication Date: April 3, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
