Japan, March 23 -- KIOXIA CORP has got intellectual property rights for 'CLEANING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2022-067029
Category (FI): H01L21/304,648@E,H10P70/00,108@E
Stage: Grant (IP right document published.)
Filing Date: April 14, 2022
Publication Date: Oct. 26, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
