Japan Intellectual Property Rights: CLEANING METHOD FOR PLASMA PROCESSING DEVICE

Japan, June 10 -- TOKYO ELECTRON LTD has got intellectual property rights for 'CLEANING METHOD FOR PLASMA PROCESSING DEVICE.' Other related details are as follows:

Application Number: JP,2024-089874

Category (FI): H10P14/60,101@C,H01L21/68@R,C23C16/44@J,H05H1/46@M,H01L21/31@C,H01L21/302,101@B,H01L21/302,101@H,H10P50/20,101@H,H10P50/20,101@B,H10P72/72

Stage: Grant (IP right document published.)

Filing Date: June 3, 2024

Publication Date: Aug. 14, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.