Japan, Feb. 24 -- DISCO ABRASIVE SYST LTD has got intellectual property rights for 'CLEANING METHOD OF PLASMA ETCHING DEVICE.' Other related details are as follows:
Application Number: JP,2022-131077
Category (FI): H01L21/302,101@H,H10P50/20,101@H
Stage: PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma etching device that can clean up a foreign matter on a retention surface in a chamber without opening the chamber.SOLUTION: A cleaning method of a plasma etching device includes a cleaning jig setting step of covering a holding surface 21 of a holding table 20 in a chamber 10 with a cleaning jig 200 having an adhesive surface 209 having adherence properties or producing adherence properties due to an external stimulus on a surface in contact with the holding surface 21, and an oxygen plasma supply step of supplying plasma into the chamber 10. In the oxygen plasma supply step, an inner wall cleaning step of removing a foreign matter attached to the inner wall of the chamber 10 with oxygen plasma gas 400, and a holding surface cleaning step of heating the cleaning jig 200 using heat generated by the oxygen plasma gas 400, bringing the softened adhesive surface 209 into close contact with the holding surface 21, and capturing the foreign matter attached to the holding surface 21 with the adhesive surface 209 are performed.SELECTED DRAWING: Figure 8 (Grant)
Filing Date: Aug. 19, 2022
Publication Date: March 1, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
