Japan Intellectual Property Rights: CLEANING NOZZLE, CLEANING DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

Japan, Sept. 30 -- MITSUBISHI ELECTRIC CORP has got intellectual property rights for 'CLEANING NOZZLE, CLEANING DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT.' Other related details are as follows:

Application Number: JP,2023-117693

Category (FI): H01L21/304,645@B,H10P70/00,105@B,H10P70/00,103@C,H10P52/00@T,H10P52/00@A,B05B7/08,B05B7/04,B05B7/06,B05B1/14@Z,B08B5/02@A,B08B3/02@G,B08B3/02@B,H01L21/304,621@B,H01L21/304,643@C

Stage: Grant (IP right granted following substantive examination.)

Filing Date: July 19, 2023

Publication Date: Jan. 30, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.