Japan, Sept. 7 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS.' Other related details are as follows:
Application Number: JP,2023-092739
Category (FI): C08F8/02,G03F7/20,521,G03F7/20,501,C08G14/12,G03F7/11,503
Stage: Grant (IP right granted following substantive examination.)
Filing Date: June 5, 2023
Publication Date: Dec. 17, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
