Japan Intellectual Property Rights: COMPOUND, POLYMER COMPOUND, PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

Japan, Aug. 26 -- NIKON CORP has got intellectual property rights for 'COMPOUND, POLYMER COMPOUND, PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD.' Other related details are as follows:

Application Number: JP,2022-209535

Category (FI): H10D30/67,102@M,H10P14/47,101,H10K59/00,H10K71/00,H10K71/20,H10D30/67,101@V,H10D30/01,202@L,H10K85/60,H10K85/10,H10K59/131,H10K59/125,H10K59/12,H10K59/10,H10K50/10,H01L29/78,616@V,H01L29/78,617@M,H01L29/78,616@L,H01L21/288@E,H10K10/46,G03F7/38,512,G03F7/004,521,C08F120/36,C07C271/12

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Dec. 27, 2022

Publication Date: July 9, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.