Japan Intellectual Property Rights: COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Japan, Jan. 19 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows:

Application Number: JP,2021-004422

Category (FI): C07C69/757@Z,C07D307/00,C07D317/64,C07D407/12,C08F20/30,G03F7/004,501,G03F7/004,503@A,G03F7/038,601,G03F7/039,601

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Jan. 14, 2021

Publication Date: Sept. 16, 2021

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.