Japan, July 14 -- CANON INC has got intellectual property rights for 'EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE.' Other related details are as follows:
Application Number: JP,2022-147948
Category (FI): G03F7/20,501,G03F7/20,521
Stage: PROBLEM TO BE SOLVED: To provide an exposure apparatus that improves throughput of an exposure processing of performing intermittent exposure.SOLUTION: An exposure apparatus has: a shutter which switches block and passing of light from a light source; a moving part which holds to move a substrate; and a control part which performs control so as to expose a first region in a first exposure period, interrupt exposure of the first region by making the illuminance of the light source lower than the illuminance of the light source in the first exposure period in a state where a shutter allows light from the light source to pass through in an interruption period after the first exposure period, expose the first region by making the illuminance of the light source higher than the illuminance of the light source in the interruption period in a state where the shutter allows light from the light source to pass through in a second exposure period after the interruption period, and move the substrate by the moving part in order to expose a second region to be exposed after the first region in a state where the shutter blocks light from the light source in a moving period after the second exposure period.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: Sept. 16, 2022
Publication Date: March 29, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
