Japan, March 23 -- KIOXIA CORP has got intellectual property rights for 'EXPOSURE MASK, PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2022-134264
Category (FI): G03F1/24,G03F7/20,503,G03F9/00@H
Stage: Grant (IP right document published.)
Filing Date: Aug. 25, 2022
Publication Date: March 7, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
