Japan, Feb. 24 -- CANON TOKKI CORP has got intellectual property rights for 'FILM DEPOSITION APPARATUS.' Other related details are as follows:
Application Number: JP,2021-096485
Category (FI): C23C14/34@C,C23C14/34@A,H10K71/16
Stage: PROBLEM TO BE SOLVED: To provide a technique for more efficiently removing impurities inside a chamber using a getter material in a film deposition apparatus for sputtering.SOLUTION: A film deposition apparatus 1 comprises: a chamber 10; a first cathode unit 4 having a first target 2 including a film deposition material and forming a film of the film deposition material on a substrate 6 by sputtering inside the chamber; and a second cathode unit 14 having a second cylindrical target 12 including the getter material, and performing sputtering while rotating the second target 12 inside the chamber. A surface of the second target 12 can be directly seen from an area A1 from which the film deposition material of the first target 2 is emitted.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: June 9, 2021
Publication Date: Dec. 21, 2022
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
