Japan, Feb. 24 -- NAN YA PLASTIC CORP has got intellectual property rights for 'FLUX CLEANING COMPOSITION.' Other related details are as follows:
Application Number: JP,2024-116671
Category (FI): C11D3/20,C11D1/90,C11D3/43,C11D1/88,C11D3/28,C11D3/06,C11D3/04,C11D3/30,C11D3/33,C11D3/37,C11D3/02,C11D3/34
Stage: PROBLEM TO BE SOLVED: To provide a flux cleaning composition.SOLUTION: A flux cleaning composition according to the present invention comprises, based on the total weight of the flux cleaning composition being 100%, includes: 2% to 20% of an amphoteric surfactant; 0.1% to 2% of a reducing agent; 5% to 10% of a chelating agent; 70% to 90% of an organic solvent; and 2.5% to 20% of water.SELECTED DRAWING: None (Grant)
Filing Date: July 22, 2024
Publication Date: July 9, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
