Japan, Feb. 24 -- NUFLARE TECHNOLOGY INC has got intellectual property rights for 'MASK INSPECTION DEVICE AND MASK INSPECTION METHOD.' Other related details are as follows:
Application Number: JP,2022-006918
Category (FI): G01N21/956@A
Stage: PURPOSE: To provide an inspection device with which it is possible to suppress background reflections of a ghost image.CONSTITUTION: An inspection device 100 in one embodiment of the present invention is characterized by having: a lens array 304 for dividing inspection light into multiple rays of light upon receiving radiation of the inspection light; a lens array stage 320 for supporting the lens array and capable of moving in a plane orthogonal to the optical axis of the inspection light; an objective lens 104 for irradiating a mask substrate on which a diagram pattern is formed, with at least some of the multiple rays of light; an imaging sensor 105 for capturing an optical image of the mask substrate that is obtained by irradiating the mask substrate with light; a luminous quantity sensor 324 for measuring the luminous quantity of the inspection light; and a stage control circuit 140 for controlling a stage so that the position of the lens array is changed when the integral amount of measured luminous quantities increases to a threshold or greater.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: Jan. 20, 2022
Publication Date: Aug. 1, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
