Japan, Sept. 30 -- SUMCO CORP has got intellectual property rights for 'METHOD FOR EVALUATING METAL CONTAMINATION IN ION IMPLANTER AND METHOD FOR MANUFACTURING ION IMPLANTED SILICON WAFER.' Other related details are as follows:
Application Number: JP,2023-153880
Category (FI): H01L21/265@T,H10P74/20@N,H10P30/20@T,H01J37/317@Z,H01L21/66@N
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Sept. 20, 2023
Publication Date: April 2, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
