Japan, Feb. 27 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK.' Other related details are as follows:
Application Number: JP,2023-064091
Category (FI): G03F1/24,G03F1/42,G03F1/84
Stage: PROBLEM TO BE SOLVED: To provide a method for evaluating an EUV mask blank that can easily evaluate processing accuracy (for example, depth) of a reference mark.SOLUTION: The present invention relates to a method for evaluating a reference mark formed on an EUV mask blank, the method including steps of: imaging the reference mark formed on the EUV mask blank to obtain a reference mark image; obtaining a reference mark contrast from the obtained reference mark image, the reference mark contrast being contrast between the reference mark and a background level; and evaluating processing accuracy of the reference mark with the obtained reference mark contrast.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: April 11, 2023
Publication Date: Oct. 24, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
