Japan, Sept. 16 -- PRIMEARTH EV ENERGY CO LTD has got intellectual property rights for 'METHOD OF MANUFACTURING NONAQUEOUS SECONDARY BATTERY.' Other related details are as follows:
Application Number: JP,2023-033008
Category (FI): H01M4/62@Z,H01M10/0567,H01M10/052,H01M10/058,H01M10/0568,H01M4/139
Stage: PROBLEM TO BE SOLVED: To provide a method of manufacturing a nonaqueous secondary battery, with which variations in specific surface areas of a negative electrode active material can be suppressed while adjusting density of a negative electrode active material layer after rolling in a desired range.SOLUTION: There is provided a method of manufacturing a nonaqueous secondary battery, the nonaqueous secondary battery including an electrode body 20 in which a positive electrode sheet 21 and a negative electrode sheet 24 are stacked via a separator 27, and a nonaqueous electrolyte containing a film forming agent including a lithium salt. The method of manufacturing a nonaqueous secondary battery includes: a coating step of manufacturing a negative electrode sheet 24 by coating a negative electrode mixture layer 26 on a negative electrode current collector 25, the negative electrode mixture layer including a negative electrode active material and an additive material including a sodium salt; and a rolling step of rolling the negative electrode sheet 24 on which the negative electrode mixture layer 26 is coated. During the coating step, the negative electrode mixture layer 26 is coated on the negative electrode current collector 25 such that the orientation of the negative electrode active material is adjusted to be a desired BET specific area, on the basis of a fact that a relationship between an amount of a change in a BET specific surface area of the negative electrode active material by the rolling step and density of the negative electrode active material varies depending on orientation.SELECTED DRAWING: Figure 2 (Grant)
Filing Date: March 3, 2023
Publication Date: Sept. 13, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
