Japan Intellectual Property Rights: NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING THE SAME

Japan, Jan. 20 -- ASAHI KASEI CORP has got intellectual property rights for 'NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING THE SAME.' Other related details are as follows:

Application Number: JP,2024-198880

Category (FI): G03F7/075,501,G03F7/004,501,G03F7/027,514,C08G73/12,H05K1/03,610@P,G03F7/20,501,G03F7/20,521,G03F7/027,502

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 14, 2024

Publication Date: Feb. 26, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.