Japan Intellectual Property Rights: ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING METHOD

Japan, April 22 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING METHOD.' Other related details are as follows:

Application Number: JP,2022-165213

Category (FI): C08F212/14,C08F220/12,C07C309/12,G03F7/004,503@A,G03F7/039,601,G03F7/004,501,G03F7/004,504,G03F7/20,521,G03F7/20,501,C07C25/02,C07C25/13,C07D333/54,C07D327/08,C09K3/00@K,C07D333/76,C07C381/12,C07C309/17

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Oct. 14, 2022

Publication Date: April 25, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.