Japan, Sept. 30 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'ONIUM SALT, RESIST COMPOSITION, AND PATTERNING METHOD.' Other related details are as follows:
Application Number: JP,2023-064766
Category (FI): C07D207/16,C07D211/44,C07D221/06,C07D405/12,C07D327/08,C08F20/22,G03F7/20,501,C07C381/12,C07C211/63,C07C25/00,C07D211/46,C09K3/00@K,C07D211/54,C07D333/76,C07D211/62,G03F7/039,601,G03F7/004,501
Stage: Grant (IP right granted following substantive examination.)
Filing Date: April 12, 2023
Publication Date: Oct. 25, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
