Japan, Jan. 20 -- ROHM & HAAS ELECTRONIC MATERIALS LLC has got intellectual property rights for 'PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS.' Other related details are as follows:
Application Number: JP,2023-169761
Category (FI): C08F220/10,G03F7/039,601,G03F7/004,501,G03F7/20,521,G03F7/20,501
Stage: Grant (IP right document published.)
Filing Date: Sept. 29, 2023
Publication Date: Dec. 26, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
