Japan Intellectual Property Rights: PHOTOSENSITIVE SURFACE TREATMENT AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF TRANSISTOR

Japan, June 10 -- UNIV KANAGAWA,NIKON CORP has got intellectual property rights for 'PHOTOSENSITIVE SURFACE TREATMENT AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF TRANSISTOR.' Other related details are as follows:

Application Number: JP,2022-131902

Category (FI): C07F7/18@S,G03F7/004,G03F7/38,512,H10K71/80,H10D30/01,206@C,H10P14/47,101,H01L29/78,627@C,H01L21/288@E,G03F7/004,521

Stage: Grant (IP right document published.)

Filing Date: Aug. 22, 2022

Publication Date: March 6, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.