Japan, Feb. 24 -- PANASONIC IP MANAGEMENT CORP has got intellectual property rights for 'PLASMA PROCESSING APPARATUS AND METHOD FOR USING PLASMA PROCESSING APPARATUS.' Other related details are as follows:
Application Number: JP,2021-194145
Category (FI): H01L21/31@C,H01L21/302,101@C,H05H1/46@L,H10P14/60,101@C,C23C16/505,C23C16/455,H10P50/20,101@C
Stage: PROBLEM TO BE SOLVED: To control an electron density distribution and a radical density distribution in a chamber.SOLUTION: A plasma processing apparatus 10 disclosed includes a chamber 11, a stage 12, a dielectric member 13, a cover 14, a gas introduction path 15, and an induction coil 16. The induction coil 16 includes a first induction coil 17 installed so as to overlap a central region R1 of the dielectric member 13, and a second induction coil 18 installed so as to overlap a peripheral region R2 outside the central region R1 of the dielectric member 13. The cover 14 has a first gas hole 14c formed at a position overlapping the central region R1 of the dielectric member 13, and a second gas hole 14d formed at a position overlapping the peripheral region R2 of the dielectric member 13. The gas introduction path 15 has a first gas introduction path 15a communicating with the first gas hole 14c and a second gas introduction path 15b communicating with the second gas hole 14d.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: Nov. 30, 2021
Publication Date: June 9, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
