Japan, July 1 -- DIC CORP has got intellectual property rights for 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST UNDERLAYER FILM, AND RESIST PERMANENT FILM.' Other related details are as follows:
Application Number: JP,2024-086088
Category (FI): C08G8/04,G03F7/11,502,C08G8/36,G03F7/11,503,G03F7/023,G03F7/039,601
Stage: Grant (IP right granted following substantive examination.)
Filing Date: May 28, 2024
Publication Date: March 17, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
