Japan Intellectual Property Rights: POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

Japan, Oct. 21 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'POSITIVE RESIST MATERIAL AND PATTERNING PROCESS.' Other related details are as follows:

Application Number: JP,2023-101799

Category (FI): G03F7/004,503@A,G03F7/004,531,C07J41/00,G03F7/20,521,G03F7/20,501,G03F7/004,504,G03F7/004,501,G03F7/039,601

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 21, 2023

Publication Date: Jan. 24, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.