Japan, Sept. 28 -- JSR CORP has got intellectual property rights for 'RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND.' Other related details are as follows:
Application Number: JP,2023-004805
Category (FI): G03F7/004,501,G03F7/039,601,G03F7/20,501,C08F20/10,C07C69/54@Z,C07D327/02,C07D333/76
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Jan. 17, 2023
Publication Date: Dec. 7, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
