Japan Intellectual Property Rights: RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER

Japan, Aug. 26 -- JSR CORP has got intellectual property rights for 'RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER.' Other related details are as follows:

Application Number: JP,2025-168676

Category (FI): G03F7/20,521,C08F20/30,G03F7/20,502,G03F7/20,501,G03F7/20,503,G03F7/20,504,G03F7/039,601,G03F7/20,506

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Oct. 6, 2025

Publication Date: Jan. 14

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.