Japan, June 10 -- HOYA CORP has got intellectual property rights for 'REFLECTION TYPE MASK BLANK, REFLECTION TYPE MASK, AND METHOD FOR MANUFACTURING REFLECTION TYPE MASK AND SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2024-093088
Category (FI): G03F1/54,G03F1/24
Stage: Grant (IP right document published.)
Filing Date: June 7, 2024
Publication Date: Aug. 21, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
