Japan, Oct. 15 -- HOYA CORP has got intellectual property rights for 'REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PRODUCING METHOD OF SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2024-228457
Category (FI): G03F1/24,G03F1/54,G03F7/20,503,G03F1/84,G03F1/72
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Dec. 25, 2024
Publication Date: March 7, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
