Japan, Jan. 27 -- APPLIED MATERIALS INC has got intellectual property rights for 'REMOVAL OF IMPURITY IN DOPED ALD TANTALUM NITRIDE.' Other related details are as follows:
Application Number: JP,2024-066962
Category (FI): H10W20/44@R,H10W20/44@X,H10W20/41@C,H10D64/62@R,H01L21/90@C,H01L21/88@R,H01L21/28,301@R,C23C16/455,C23C16/34
Stage: Grant (IP right granted following substantive examination.)
Filing Date: April 17, 2024
Publication Date: Oct. 2, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
