Japan Intellectual Property Rights: RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND AND POLYMER COMPOUND

Japan, Aug. 31 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND AND POLYMER COMPOUND.' Other related details are as follows:

Application Number: JP,2022-027170

Category (FI): G03F7/004,501,G03F7/20,521,G03F7/004,503@A,G03F7/039,601,C08F12/34,C07C69/88,G03F7/20,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Feb. 24, 2022

Publication Date: Sept. 5, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.