Japan, March 25 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows:
Application Number: JP,2025-004017
Category (FI): C07D321/10,C07D333/52,C07D333/76,C08F212/14,C08F220/18,C08F8/12,G03F7/004,503@A,G03F7/039,601,G03F7/20,502,G03F7/20,503,G03F7/20,504,G03F7/20,505,G03F7/20,521
Stage: Grant (IP right document published.)
Filing Date: Jan. 10, 2025
Publication Date: April 23, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
