Japan, Feb. 18 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERN FORMATION METHOD.' Other related details are as follows:
Application Number: JP,2023-037098
Category (FI): G03F7/004,503@A,G03F7/20,521,G03F7/039,601,G03F7/004,501
Stage: Grant (IP right granted following substantive examination.)
Filing Date: March 10, 2023
Publication Date: Oct. 6, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
