Japan Intellectual Property Rights: RESIST MATERIAL AND PATTERNING METHOD

Japan, Oct. 7 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERNING METHOD.' Other related details are as follows:

Application Number: JP,2023-130989

Category (FI): G03F7/20,521,C07D333/76,C07D327/08,C07D333/54,C08F12/22,C08F20/10,C07D307/00,G03F7/004,501,G03F7/004,504,G03F7/038,601,G03F7/039,601,G03F7/004,503@A,G03F7/20,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Aug. 10, 2023

Publication Date: March 22, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.