Japan Intellectual Property Rights: SILICA-BASED PARTICLE DISPERSION, POLISHING SLURRY FOR POLISHING MAGNETIC DISK SUBSTRATE CONTAINING THE SAME, COMPOSITION FOR POLISHING MAGNETIC DISK SUBSTRATE CONTAINING THE SAME, AND METHOD FOR PRODUCING SILICA-BASED PARTICLE GROUP

Japan, March 3 -- JGC CATALYSTS & CHEMICALS LTD has got intellectual property rights for 'SILICA-BASED PARTICLE DISPERSION, POLISHING SLURRY FOR POLISHING MAGNETIC DISK SUBSTRATE CONTAINING THE SAME, COMPOSITION FOR POLISHING MAGNETIC DISK SUBSTRATE CONTAINING THE SAME, AND METHOD FOR PRODUCING SILICA-BASED PARTICLE GROUP.' Other related details are as follows:

Application Number: JP,2022-045052

Category (FI): C09K3/14,550@D,C09K3/14,550@Z,B01J13/00@B,C01B33/141

Stage: Grant (IP right granted following substantive examination.)

Filing Date: March 22, 2022

Publication Date: Oct. 4, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.