Japan, Oct. 21 -- HOYA CORP has got intellectual property rights for 'SUBSTRATE INCLUDING MULTILAYER REFLECTION FILM, REFLECTION TYPE MASK BLANK, REFLECTION TYPE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR.' Other related details are as follows:
Application Number: JP,2025-077320
Category (FI): G03F1/24,G03F1/48,G03F7/20,503,G03F7/20,521
Stage: Grant (IP right granted following substantive examination.)
Filing Date: May 7, 2025
Publication Date: July 10, 2025
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
