Japan Intellectual Property Rights: SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATOR, PLASMA GENERATION METHOD, SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

Japan, March 3 -- KOKUSAI ELECTRIC CORP has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATOR, PLASMA GENERATION METHOD, SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM.' Other related details are as follows:

Application Number: JP,2023-107577

Category (FI): H05H1/46@M,H10P14/692@X,H10P14/694@A,H01L21/31@C,H01L21/316@X,H01L21/318@A,C23C16/507,H10P14/60,101@C

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 29, 2023

Publication Date: April 2, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.