Japan Intellectual Property Rights: SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Japan, Jan. 21 -- KIOXIA CORP has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE.' Other related details are as follows:

Application Number: JP,2022-149740

Category (FI): H10P72/30@A,H10P14/60,101@B,C23C16/44@F,H01L21/68@A,H01L21/68@N,H01L21/31@B,H10P72/70

Stage: Grant (IP right document published.)

Filing Date: Sept. 21, 2022

Publication Date: April 2, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.