Japan, Sept. 18 -- SCREEN HOLDINGS CO LTD has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD.' Other related details are as follows:
Application Number: JP,2022-152228
Category (FI): H10P70/00,201@B,H10P70/00,108@G,H10P70/00,108@A,H10P70/00,104@C,H10P70/00,104@B,H01L21/68@A,H01L21/304,651@B,H01L21/304,648@G,H01L21/304,644@B,H01L21/304,644@C,H01L21/304,648@A,H10P72/30@A
Stage: PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method capable of suppressing the occurrence of substrate processing defects caused by positional misalignment.SOLUTION: A substrate cleaning apparatus 1 includes a chamber, a first processing portion, and a second processing portion. The chamber forms a processing space that includes a first processing location and a second processing location. The first processing portion performs first processing on a substrate W placed at the first processing location within the chamber. The second processing portion performs second processing on the substrate W placed at the second processing location within the chamber. A main robot 300 carries the substrate W into and out of the substrate cleaning apparatus 1 by moving a hand Ma that holds the substrate W. Furthermore, the main robot 300 receives the substrate W placed at the first processing location by entering the hand Ma into the processing space, transports it to the second processing location, and positions it.SELECTED DRAWING: Figure 1 (Grant)
Filing Date: Sept. 26, 2022
Publication Date: April 5, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
