Japan, July 14 -- SCREEN HOLDINGS CO LTD has got intellectual property rights for 'SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD.' Other related details are as follows:
Application Number: JP,2022-159393
Category (FI): H01L21/68@A,H10P72/70,H10P72/30@A,H10P70/00,108@D,H10P70/00,102@A,H10P50/60@J,H01L21/68@N,H01L21/306@K,H01L21/304,648@D,H01L21/304,642@A
Stage: PROBLEM TO BE SOLVED: To provide a substrate processing device and a substrate processing method, capable of maintaining the uniformity of substrate surface treatment while preventing a tilt of the substrate.SOLUTION: Surface treatment is performed while a substrate W is immersed in processing liquid stored in a processing tank 10. During treatment, a holding state is switched from a first state where the substrate W is held at a high processing position by a lifter 20 into a second state where the substrate W is held at a low processing position by a substrate holding part 50. By switching the holding state, singularities where treatment efficiency is reduced due to a contact can be eliminated so that the entire surface of the substrate W can be treated uniformly. In addition, when the substrate W is held at the high processing position, a tilt of the substrate W is prevented by a first guide 61, and when the substrate W is held at the low processing position, a tilt of the substrate W is prevented by a second guide 62. Thus, the uniformity of surface treatment of the substrate W can be maintained while a tilt of the substrate W is prevented.SELECTED DRAWING: Figure 2 (Grant)
Filing Date: Oct. 3, 2022
Publication Date: April 15, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
