Japan, Jan. 23 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE-PROCESSING METHOD AND PLASMA-PROCESSING DEVICE.' Other related details are as follows:
Application Number: JP,2022-137721
Category (FI): H01L21/302,105@A,H10P50/28,H10P50/20,105@A,H10P50/20,101@B,H05H1/46@M,H01L21/302,101@B
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Aug. 31, 2022
Publication Date: March 13, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
