Japan Intellectual Property Rights: SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Japan, Jan. 20 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS.' Other related details are as follows:

Application Number: JP,2024-206260

Category (FI): G03F7/30,501,G03F7/004,531,G03F7/20,521,H10P76/00,563,H10P76/00,564@C,H01L21/30,573,H01L21/30,564@C,G03F7/16,502,H01L21/30,563

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 27, 2024

Publication Date: Feb. 14, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.