Japan Intellectual Property Rights: SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD AND PROGRAM

Japan, March 24 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD AND PROGRAM.' Other related details are as follows:

Application Number: JP,2022-144789

Category (FI): H01L21/02@Z,H01L21/31@E,H01L21/68@G,H10P14/60,101@E,H10P72/50@G,H10P95/00,102@D

Stage: Grant (IP right document published.)

Filing Date: Sept. 12, 2022

Publication Date: March 25, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication.