Japan, April 22 -- SICRYSTAL GMBH has got intellectual property rights for 'SYSTEM FOR MANUFACTURING HIGH-QUALITY SEMICONDUCTOR SINGLE CRYSTAL AND METHOD OF MANUFACTURING THE SAME.' Other related details are as follows:
Application Number: JP,2024-016507
Category (FI): C30B23/06,C30B29/36@A
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Feb. 6, 2024
Publication Date: Aug. 21, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication.
